4-(甲磺酰)苯磺酰氯,4-(Methylsulfonyl)benzenesulfonyl chloride;97%
最近浏览商品
- 氯铂酸水合物,Chloroplatinic acid hydrate;99.995% trace metals basis
- 2,2-双(羟甲基)丙酸,2,2-Bis(hydroxymethyl)propionic acid [Bis-MPA, DMPA];98%
- 过氧化苯甲酰,Luperox® A75, Benzoyl peroxide [BPO];75%, remainder water
- 草酸二水合物,Oxalic acid dihydrate [OAD];EMPLURA®, ≥99% (manganometric)
- 乙酰丙酮,Acetylacetone;produced by Wacker Chemie AG, Burghausen, Germany, ≥99.5% (GC)
- 氧化石墨烯,Graphene oxide;4 mg/mL, dispersion in H2O, avg. no. of layers, 1